Home > News > Lithography makes a connection for nanowire devices
June 9th, 2004
Lithography makes a connection for nanowire devices
Abstract:
Researchers at Harvard University, US, have used a photolithography technique to set up interconnects to nanowire devices. The method uses a statistical approach to ensure that a high proportion of the nanowires connects to the electrodes - there is no need to link the two components individually. “We believe this is the first reported bottom-up assembly and device integration approach that is fully scalable in terms of device density and area of coverage,” Song Jin and Dongmok Whang told nanotechweb.org. “It provides a pathway for the development of highly functional and integrated nanosystems.”
Source:
Nanotechweb
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