Home > News > JMAR Improves CPL Reliability and Productivity for X-Ray Litho
April 5th, 2004
JMAR Improves CPL Reliability and Productivity for X-Ray Litho
Abstract:
JMAR Technologies, Inc. reported that the recent endurance trial of its Collimated Plasma Lithography (CPL(TM)) X-ray light source and wafer exposure system achieved significantly improved reliability and productivity while printing sub-90 nanometer features. As a result of the Company's progress, Defense Advanced Research Projects Agency released a new $1.6 million block of funding, $800,000 of which was announced by the Company last week.
Source:
Businesswire
Bookmark:
| Related News Press |
Investments/IPO's/Splits
Daikin Industries becomes OCSiAl shareholder July 27th, 2021
INBRAIN Neuroelectronics raises over €14M to develop smart graphene-based neural implants for personalised therapies in brain disorders March 26th, 2021
180 Degree Capital Corp. Issues Second Open Letter to the Board and Shareholders of Enzo Biochem, Inc. March 26th, 2021
Chip Technology
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
New discovery aims to improve the design of microelectronic devices September 13th, 2024
Groundbreaking precision in single-molecule optoelectronics August 16th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||