Home > News > Samsung develops CVD wiring process for 70-nm DRAM
May 28th, 2004
Samsung develops CVD wiring process for 70-nm DRAM
Abstract:
Samsung Electronics Co. Ltd. has developed a chemical vapor deposition (CVD) method for depositing aluminum interconnect in DRAMs using a 70-nm manufacturing process, the company said Thursday (May 27). The company also said it expects to unveil "70-nm class" DRAMs before the end of 2004.
Source:
EETimes
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