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December 1st, 2007

Metrology Drives Nanotech Progress

Abstract:
In a conference presentation,1 Mark Durcan, president and COO of Micron Technology (Boise Idaho), outlined some of the challenges nanotech faces. While admitting that progress was taking place, he also warned that there are many difficulties, such as randomness issues associated with dealing with large and small numbers, mechanical issues at small dimensions, and increasing difficulties of patterning and metrology.

Source:
semiconductor.net

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