Nanotechnology Now - Press Release: Free webinar on Wednesday 19th October at 15:00 BST: Discover Oxford Instruments’ latest process innovation: SiC via etch for RF device manufacture

Home > Press > Free webinar on Wednesday 19th October at 15:00 BST: Discover Oxford Instruments’ latest process innovation: SiC via etch for RF device manufacture

Abstract:
SiC is becoming an increasingly important material, particularly in the arena of high performance GaN RF devices using SiC as a substrate. A smooth via etch through the SiC is essential to enable these devices, and Oxford Instruments has just announced the ideal solution for etching high quality SiC vias efficiently, its high performance PlasmaPro 100 Polaris etch system.

Free webinar on Wednesday 19th October at 15:00 BST: Discover Oxford Instruments’ latest process innovation: SiC via etch for RF device manufacture

Yatton, UK | Posted on October 7th, 2016

Combined with a low damage GaN etch within the same hardware, the PlasmaPro100 Polaris offers a unique capability for GaN based RF device plasma etch processing requirements.

In a webinar at 15:00 BST on 19th October, Dr Mark Dineen, Product Manager (Optoelectronics and Discrete Devices) at Oxford Instruments Plasma Technology, will describe this latest technology that offers several process capabilities suited to the SiC via application.

Dr Dineen states, “Our Applications specialists have spent significant time developing this SiC via etch process on the PlasmaPro100 Polaris etch system, enabling high selectivity and throughput amongst other benefits. These will enable our customers to etch both SiC and GaN in the same tool through advanced plasma source technology, as will be described in this webinar.”

Register at: http://www.oxford-instruments.com/SiCVia-Webinar

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Issued for and on behalf of Oxford Instruments Plasma Technology

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About Oxford Instruments Plasma Technology
Oxford Instruments Plasma Technology offers flexible, configurable process tools and leading-edge processes for the precise, controllable and repeatable engineering of micro- and nano-structures. Our systems provide process solutions for the etching of nanometre sized features, nanolayer deposition and the controlled growth of nanostructures.

These solutions are based on core technologies in plasma-enhanced deposition and etch, ion-beam deposition and etch, atomic layer deposition, deep silicon etch and physical vapour deposition. Products range from compact stand-alone systems for R&D, through batch tools and up to clustered cassette-to-cassette platforms for high-throughput production processing.

About Oxford Instruments plc

Oxford Instruments designs, supplies and supports high-technology tools and systems with a focus on research and industrial applications. Innovation has been the driving force behind Oxford Instruments' growth and success for over 50 years, and its strategy is to effect the successful commercialisation of these ideas by bringing them to market in a timely and customer-focused fashion. The first technology business to be spun out from Oxford University, Oxford Instruments is now a global company and is listed on the London Stock Exchange (OXIG). Its objective is to be the leading provider of new generation tools and systems for the research and industrial sectors with a focus on nanotechnology. Its key market sectors include nano-fabrication and nano-materials. The company’s strategy is to expand the business into the life sciences arena, where nanotechnology and biotechnology intersect

This involves the combination of core technologies in areas such as low temperature, high magnetic field and ultra high vacuum environments; Nuclear Magnetic Resonance; X-ray, electron, laser and optical based metrology; atomic force microscopy; optical imaging; advanced growth, deposition and etching.

Oxford Instruments aims to pursue responsible development and deeper understanding of our world through science and technology. Its products, expertise, and ideas address global issues such as energy, environment, security and health.

For more information, please click here

Contacts:
Susie Williams
Marketing Communications Manager
Oxford Instruments Plasma Technology
susie.williams@oxinst.com
Tel: +44 (0)1934 837000
Fax: +44 (0)1934 837001

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