Home > News > Tegal Corporation Announces High-K Nano Layer Deposition Project
April 13th, 2004
Tegal Corporation Announces High-K Nano Layer Deposition Project
Abstract:
Tegal Corporation and Sharp Laboratories of America have entered into an agreement to collaborate on a focused joint development program (JDP) to accelerate the adoption and integration of next generation high-K dielectrics. The JDP builds on Tegal's patented Nano Layer Deposition (NLD) technology for depositing ultra thin layers of new dielectric materials for semiconductor and nanotechnology device production.
Source:
Businesswire
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