Home > News > Rohm and Haas Purchases Coating Cluster from SUSS MicroTec for Resist and Spin-on Dielectric Qualification
September 11th, 2007
Rohm and Haas Purchases Coating Cluster from SUSS MicroTec for Resist and Spin-on Dielectric Qualification
Abstract:
SUSS MicroTec (FWB:SMH) (GER:SMH) announced today it has received the first order for its new Gamma XPress coat / develop cluster from Rohm and Haas Electronics Materials, a world leader in the development and manufacture of electronic materials for the semiconductor markets. The system from SUSS MicroTec will be used by Rohm and Haas Electronic Materials to develop, characterize and optimize photodielectrics and both thick and thin photoresists. The SUSS Gamma XPress was chosen over alternative equipment due to its superior thick resist processing capability and its bridge tool design that permits concurrent handling of wafers with different sizes without mechanical changeover.
Source:
SUSS MicroTec
Bookmark:
| Related News Press |
Chip Technology
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
New discovery aims to improve the design of microelectronic devices September 13th, 2024
Groundbreaking precision in single-molecule optoelectronics August 16th, 2024
Announcements
Nanotechnology: Flexible biosensors with modular design November 8th, 2024
Exosomes: A potential biomarker and therapeutic target in diabetic cardiomyopathy November 8th, 2024
Turning up the signal November 8th, 2024
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
Tools
Turning up the signal November 8th, 2024
Quantum researchers cause controlled ‘wobble’ in the nucleus of a single atom September 13th, 2024
Faster than one pixel at a time – new imaging method for neutral atomic beam microscopes developed by Swansea researchers August 16th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||